[1]葛少博,刘卫国,周 顺,等.薄膜光学微金字塔结构阵列的制备研究[J].西安工业大学学报,2019,(03):253-259265.[doi:10.16185/j.jxatu.edu.cn.2019.03.003]
 GE Shaobo,LIU Weiguo,ZHOU Shun,et al.Preparation of Thin Film Optical Micropyramid Structures Array[J].Journal of Xi’an Technological University,2019,(03):253-259265.[doi:10.16185/j.jxatu.edu.cn.2019.03.003]
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薄膜光学微金字塔结构阵列的制备研究()
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《西安工业大学学报》[ISSN:1673-9965/CN:61-1458/N]

卷:
期数:
2019年03期
页码:
253-259265
栏目:
出版日期:
2019-06-20

文章信息/Info

Title:
Preparation of Thin Film Optical Micropyramid Structures Array
文章编号:
1673-9965(2019)03-0253-07
作者:
葛少博1刘卫国1周 顺1李世杰1黄岳田2
(1.西安工业大学 光电工程学院/陕西省薄膜技术与光学检测重点实验室,西安 710021; 2.中国科学院光电技术研究所,成都 610209)
Author(s):
GE Shaobo1LIU Weiguo1ZHOU Shun1LI Shijie1HUANG Yuetian2
(1.Shaanxi Province Key Laboratory of Thin Films Technology and Optical Test,School of Photoelectric Engineering,Xi’an Technological University,Xi’an 710021,China;2.Institute of Optics and Electronics Chinese Academy Science,Chengdu 610209,China)
关键词:
微金字塔结构 等效折射率 单点金刚石车削 纳米压印 电感耦合等离子体刻蚀
Keywords:
micropyramid structure equivalent index single point diamond turning nanoimprint lithography inductively coupled plasma etching
分类号:
O484.1
DOI:
10.16185/j.jxatu.edu.cn.2019.03.003
文献标志码:
A
摘要:
为了解决薄膜光学微结构中等效折射率梯度分布的问题。本文研究了轮廓渐变的薄膜微金字塔结构阵列,分析了微金字塔结构的典型制备工艺,提出了一种单点金刚石车削,结合纳米压印与电感耦合等离子体刻蚀技术的制备方法。实验结果表明:单点金刚石飞切形成的金字塔结构单元的尺寸可以在1~10 μm之间进行调控,切削5 min可以形成直径12.5 mm的微结构成型区域; 纳米压印技术与电感耦合等离子体刻蚀方法的结合,实现了薄膜光学微金字塔结构阵列的制备。
Abstract:
The study is intended to discuss the equivalent refractive index gradient distribution in the thin film optical microstructures.Based on the study of thin-film optical micropyramid structures array with contour gradients and the analysis of the typical preparation process of the micropyramid structure,a preparation process of single point diamond turning is proposed,in combination with nanoimprint lithography and inductively coupled plasma etching.Experimental results show that the size of the pyramidal unit formed by single-point diamond fly cutting can be adjusted between 1 μm and 10 μm and that a microstructured molding area with a diameter of 12.5 mm can be formed in 5 min.The thin film optical micropyramid structures array is prepared by the method which combines nanoimprint lithography with inductively coupled plasma etching technology.

参考文献/References:

[1] GRUNWALD R.Thin Film Micro-Optics[M].Berlin:University of Berlin,2007.
[2] PIESTUN R,SHAMIR J.Control of Wave-front Propagation with Diffractive Elements[J].Optics letters,1994,19(11):771.
[3] GRUNWALD R,KEBBEL V,NEUMANN U J,et al.Ultrafast Spatiotemporal Processing with Thin-film Micro-Optics[J].Optical Engineering,2004,43(11):2518.
[4] HWANG B,LEE J S.A Strategy to Design High-Density Nanoscale Devices Utilizing Vapor Deposition of Metal Halide Perovskite Materials[J].Advanced Materials,2017,29(29):1701048
[5] RANA S,RAKIN A S,HASAN M R,et al.Low Loss and Flat Dispersion Kagome Photonic Crystal Fiber in the Terahertz Regime[J].Optics Communications,2018,410:452.
[6] CHENG J,JIA H,WU Q,et al.Optical Filter Based on Metallic Glass MgZnCa Micro/nano-structure array[C]//Sixth International Conference on Optical and Photonic Engineering(ICOPEN 2018).Xi’an:International Society for Optics and Photonics,2018,10827:1082737.
[7] GUO S,LIU R,NIU C,et al.Tin Nanoparticles–Enhanced Optical Transportation in Branched CdS Nanowire Waveguides[J].Advanced Optical Materials,2018,6(17):1800305.
[8] HUANG B R,YANG Y K,YANG W L.Key Technique for Texturing a Uniform Pyramid Structure with a Layer of Silicon Nitride on Monocrystalline Silicon Wafer[J].Applied Surface Science,2013,266(2):245.
[9] SIVASUBRAMANIAM S,ALKAISI M M.Inverted Nanopyramid Texturing for Silicon Solar Cells Using Interference Lithography[J].Microelectronic Engineering,2014,119:146.
[10] AMALATHAS A P,ALKAISI M M.Periodic Upright Nanopyramid Fabricated by Ultraviolet Curable Nanoimprint Lithography for Thin Film Solar Cells[J].International Journal of Nanotechnology,2017,14(1/6):3.

备注/Memo

备注/Memo:
收稿日期:2018-10-15基金资助:国家基础研究项目(JCKY2016208A002); 陕西省教育厅重点实验室科研计划项目(16JS039); 先进制造项目(41423020111)。第一作者简介:葛少博(1990-),男,西安工业大学博士研究生,主要研究方向为半导体薄膜材料,E-mail:geshaobo@126.com。通信作者简介:刘卫国(1964-),男,西安工业大学教授,主要研究方向为光电子技术及电子材料,E-mail:wgliu@163.com。引文格式:葛少博,刘卫国,周顺,等.薄膜光学微金字塔结构阵列的制备研究[J].西安工业大学学报,2019,39(3):253-259.GE Shaobo,LIU Weiguo,ZHOU Shun,et al.Preparation of Thin Film Optical Micropyramid Structures Array[J].Journal of Xi’an Technological University,2019,39(3):253-259.
更新日期/Last Update: 2019-06-20