[1]海文文,尚小燕.衬底材料对热蒸发法制备TiO2薄膜的影响[J].西安工业大学学报,2020,(01):32-37.[doi:10.16185/j.jxatu.edu.cn.2020.01.005 ]
 HAI Wenwen,SHANG Xiaoyan.Effect of Substrate Material on TiO2 Film Prepared by Thermal Evaporation[J].Journal of Xi'an Technological University,2020,(01):32-37.[doi:10.16185/j.jxatu.edu.cn.2020.01.005 ]
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衬底材料对热蒸发法制备TiO2薄膜的影响()
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《西安工业大学学报》[ISSN:1673-9965/CN:61-1458/N]

卷:
期数:
2020年01期
页码:
32-37
栏目:
光电工程
出版日期:
2020-02-15

文章信息/Info

Title:
Effect of Substrate Material on TiO2 Film Prepared by Thermal Evaporation
文章编号:
1673-9965(2020)01-0032-06
作者:
海文文尚小燕
(西安工业大学 光电工程学院,西安 710021
Author(s):
HAI WenwenSHANG Xiaoyan
(School of Photoelectric Engineering,Xi'an Technological University,Xi'an 710021,China)
关键词:
衬底材料 TiO2薄膜 热张应力 致密度 激光损伤阈值
Keywords:
ubstrate material TiO2 film hot tensile stress density laser induced damage threshold
分类号:
O484
DOI:
10.16185/j.jxatu.edu.cn.2020.01.005
文献标志码:
A
摘要:
为了探究TiO2薄膜在不同衬底材料上的光学特性和激光损伤阈值,以高阻硅、熔石英和k9玻璃为衬底材料,采用真空热蒸发方法制备TiO2薄膜,利用变角度宽光谱椭偏仪、紫外可见分光光度计和激光损伤测试系统表征不同衬底上薄膜的膜厚、折射率、消光系数、透过率、光学带隙以及激光损伤阈值。研究结果表明:对比3种衬底材料,高阻硅上沉积的TiO2薄膜具有高的折射率和低的消光系数; 熔石英上沉积的TiO2薄膜具有高的透过率和宽的光学带隙; k9玻璃上沉积的TiO2薄膜具有窄的光学带隙,熔石英和k9玻璃上TiO2薄膜的激光损伤阈值相差不大。不同衬底上沉积的薄膜结构不同,导致性能不同。
Abstract:
In order to explore the optical properties and laser damage thresholds of TiO2 films on different substrate materials,TiO2 films were prepared by vacuum thermal evaporation,with high resistance silicon,fused silica and k9 glass as the substrate materials,respectively.The film thickness,refractive index and extinction coefficient of the thin films on different substrates were analyzed with a variable angle wide spectral ellipsometer,their transmittance and optical band gap were detected by an ultraviolet visible spectrophotometer and their laser damage thresholds on different substrates were measured with a laser damage test system.The results show that by comparing the thin films on the three kinds of substrate material,the TiO2 film deposited on high-resistance silicon has a high refractive index and low extinction coefficient; the TiO2 film deposited on fused silica has a high transmittance and wide optical band gap; the TiO2 film deposited on k9 glass has a narrow optical band gap.There is little difference between the laser damage thresholds of the TiO2 films deposited on fused silica and on k9 glass.The films deposited on different substrate materials are different in structure,thus having different properties.

参考文献/References:

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备注/Memo

备注/Memo:
收稿日期:2019-09-06
基金资助:陕西省教育厅重点科学研究计划(18JS046)。 第一
作者简介:海文文(1992-),女,西安工业大学硕士研究生。 通信作者简介:尚小燕(1978-),女,西安工业大学副教授,主要研究方向为光电检测技术,E-mail:shaxiayan@126.com。
(编辑、校对 潘秋岑)
更新日期/Last Update: 2020-02-15